The finishing surface CuCr Copper-chromium-sputtering target Ion Beam Sputtering

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price: Negotiable
minimum:
Total supply:
Delivery term: The date of payment from buyers deliver within days
seat: Beijing
Validity to: Long-term effective
Last update: 2017-12-22 04:02
Browse the number: 183
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Product details
CuCr target Copper-chromium target (MAT-CN)

Physical properties


Color


silver

Density


-g/m³

Melting point


-

Technical indicators


purity


99.99%

Relative density


>99.9%

Cut surface flatness


3.2Ra

Tolerance


±0.1mm

grain size


uniform

Material


CuCr

Brand


MAT-CN

Origin


Nanchang Jiangxi China

Specifications


Size 1: diameter <360mm

thickness> 1 mm

(wafer / round table / rod)

Size 2: length <300mm

width <300mm

thickness> 1mm

(rectangular / sheet /splicing)

Size 3: outer diameter <360mm

inner diameter> 1mm

length> 1 mm

(pipe / ring / rotatable targets)

Size 4:be customized according to user needs, sample processing, to map processing

Minimum order quantity


1 piece,large concessions

Supply capacity


the same batch, the same material, continuous and reliable supply; 100 kg / month min

Delivery time


3 weeks after payment,excluding special materials

Production process


vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments


various models magnetron sputtering equipment, etc.

Product uses


industrial-grade coating, experiments or research level CuCr target electronics, optoelectronics, military, decorative, functional film

Advantages

quality


1.reasonable price and good quality

2.high purity, less impurities

3.dense, rolling, oxidation, forming plasticizers

4.relatively high density, grain uniformity axis, consistency
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